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Photomask and next-generation lithography mask technology XVI (8-10 April 2009, Yokohama, Japan)Hosono, Kunihiro.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, various pagings, isbn 978-0-8194-7656-2 0-8194-7656-0Conference Proceedings
